Nanotechnology Laboratory

  • Production of nanostructures by electron (EBL) and ion-beam lithography (focused ion beam - FIB), including the preparation of thin films by spin coating.

  • Characterization of nanostructures and imaging conductive and non-conductive samples using electron microscopy (SEM).

Laboratoř nanotechnologie      Laboratoř nanotechnologie


  1. Raith e_LiNE plus: Electron lithograph (EBL) and microscope (SEM) to enable writing of nanostructures with a resolution better than 10 nm (in HSQ, respectively. 20 nm in PMMA) lithograph table with laser-interferometric subtraction position allows unseating the write field with an accuracy of ~ 30 nm, secondary detectors (Everhart-Thornley, InLens) and backscattered (BSE) electron.
  2. FEI DualBeam Versa3D: Stations combining electron and ion column enables scanning electron microscopy (SEM) with a resolution down to 1 nm and enabling work in both high and low vacuum (suitable for non-conductive samples). Ionic column allows both direct write 3D nanostructures of various materials (metals, glass, polymers, etc.) and ion microscopy (SIM).
  3. Laurell WS-650: Assembly spin-coating of thin films (spin-coater).

IPE carries out fundamental and applied research in the scientific fields of photonics, optoelectronics and electronics. In these fields, IPE generates new knowledge and develops new technologies.

Contact us

Data box: m54nucy

IČ: 67985882
DIČ: CZ67985882