Various wet chemistry methods allow for the deposition of nanomaterials, nanostructures, and thin films with a given morphology, geometry, structure, and physical properties. These methods include chemical bath deposition, sol-gel, hydrothermal growth in an autoclave, dip coating, spin coating, electrophoretic deposition, and mist chemical vapor deposition (mist-CVD).
Equipment:
- Flow reactor for chemical bath deposition with variable heating and reactant flow rates
- PPL-lined autoclave for hydrothermal growth
- Mist chemical vapor deposition (mist-CVD)
- Rapid thermal annealing systems (MILA-5000: RT-1200°C, in various atmospheres)
- Fully computer-controlled electrophoretic deposition cells using direct and time-varying electric fields
- Box with an inert (nitrogen) atmosphere (Jacomex Campus)
- Cleanroom facility class 10000 with Herasafe KSP12 Class II/Type A2 Biological safety cabinet
- Tubular furnace for annealing in various atmospheres at temperatures up to 1000 °C
- Laurell WS-650-23 Spin Coater
