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Milan Vala

Milan Vala, Ph.D.

Milan Vala
Position: Deputy team leader, Research scientist
Department: Nano Optics
+420 266 773 473
vala@ufe.cz
Location: Main building of UFE, Praha 8 - Kobylisy

Research interests:

Nano-optics, biophotonics, nanofabrication, plasmonics.

Professional activities:

2017–present: Research scientist (since 2021), Postdoctoral fellow (2017-2020), Nano Optics, Institute of Photonics and Electronics of the Czech Academy of Sciences, Prague, Czech Republic

2016–2017: Postdoctoral fellow, Laboratory of Nanostructures and Biosensing, University of Minnesota, Twin Cities, Minnesota, USA

2005–2016: Postdoctoral fellow (2015–2016), graduate student (2006–2015), research staff (2005–2006), Optical Biosensors, Institute of Photonics and Electronics of the Czech Academy of Sciences, Prague, Czech Republic

Education:

2015  Ph.D., Quantum optics and optoelectronics, Charles University in Prague, Faculty of Mathematics and Physics

2006  MSc., Optics and optoelectronics, Charles University in Prague, Faculty of Mathematics and Physics

Patents:

  • J. Homola, M. Piliarik, I. Tichý, M. Vala, P. Adam, J. Hepnar, K. Chadt. Surface Plasmon Resonance coupler and Disperser Sensor / Senzor založený na excitaci a disperzi povrchových plasmonů. USA. Patent, č. US 8094316, 1.10.2012.

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Publications

Books:

Book chapters:

Journal papers:

M. Vala, Ch. T. Ertsgaard, N. J. Wittenberg and S.H. Oh, "Plasmonic Sensing on Symmetric Nanohole Arrays Supporting High-Q Hybrid Modes and Reflection Geometry", ACS Sensors. 4(12), 3265-3274 (2019) doi:10.1021/acssensors.9b01780
M. Vala and J. Homola, "Multiple beam interference lithography: A tool for rapid fabrication of plasmonic arrays of arbitrary shaped nanomotifs", Optics Express. 24(14), 15656-15665 (2016) doi:10.1364/OE.24.015656
H. Vaisocherová-Lísalová, F. Surman, I. Víšová, M. Vala, T. Špringer, M. Ermini, H. Šípová, P. Šedivák, M. Houska, T. Riedel, O. Pop-Georgievski, E. Brynda and J. Homola, "Copolymer Brush-Based Ultralow-Fouling Biorecognition Surface Platform for Food Safety", Analytical Chemistry. 88(21), 10533-10539 (2016) doi:10.1021/acs.analchem.6b02617
M. Vala and J. Homola, "Flexible method based on four-beam interference lithography for fabrication of large areas of perfectly periodic plasmonic arrays", Optics Express. 22(15), 18778-18789 (2014) doi:10.1364/OE.22.018778
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